Information Previously, a number of studies have been conducted to develop high-speed laser diode drivers implemented in bulk CMOS processes for optical interconnects. Especially for long-range LiDAR
Information Here, we report the first electrically driven GaAs-based multi-quantum-well laser diodes fully fabricated on 300 mm Si wafers in a CMOS pilot manufacturing line.
Information The electrically-driven GaAs multi-quantum-well nano-ridge laser diodes are monolithically fabricated on 300mm silicon wafers in the imec CMOS pilot prototyping line. At
Information To the best of our knowledge, the presented work marks the first monolithic III-V laser diode integration on 300 mm Si wafers entirely carried out in a CMOS manufacturing pilot line, without the need for
Information Discover the industry-leading reliability and performance of TRUMPF''s laser diode pump modules. We offer a flexible portfolio of high-power modules with both bar-based and single-emitter based laser
Information Single-photon avalanche diode (SPAD) fabricated in complimentary metal–oxide–semiconductor (CMOS) process emerges as one of the best photon counters in the
Information A new integration approach, nano-ridge engineering, enables electrically driven GaAs-based laser diodes to be fabricated on Si wafers in a complementary metal–oxide–semiconductor
Information A reconfigurable dual-mode laser diode driver has been designed in a standard 180-nm CMOS process for iToF (indirect Time-of-Flight) and dToF (direct Time-of-Fli
Information The stabilized external cavity tunable laser (ECTL, left) and stabilized stimulated Brillouin scattering laser (SBS, right) are both fabricated in an 80 nm thick silicon nitride (Si3N4) CMOS-compatible
Information Leveraging the low-defectivity GaAs nano-ridge structures, the lasers integrate InGaAs multiple quantum wells (MQWs) as the optical gain region, embedded in an in-situ doped p-i-n diode
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